1 quartz crucible can be used in 1450 degrees, divided into two kinds of transparent and opaque. With arc discharge method, translucent quartz crucible is pulling large diameter single crystal silicon, the development of large scale integrated circuit essential base material. Today, the world's semiconductor industry developed countries have used this crucible to replace the small transparent quartz crucible. He has high purity and strong heat resistance, large size high precision, good heat insulation, energy saving, stable quality etc..
2, can not touch the HF and, at high temperature, and carbonate was easily caustic and alkali metal.
3 quartz crucible suitable for use K2S2O7, KHSO4 and Na2S207 as flux melted samples (first drying at 212 degrees) as flux sample.
4 quartz brittle, easy to break, the use should pay attention to.
5 in addition to HF, quartz glass crucible
Ordinary dilute inorganic acid can be used as cleaning solution. The common drawing for single crystal silicon quartz crucible 18 inch and 20 inch 22 inch has 22 or more of the manufacturers use crucible. At present, the crucible technology is more mature in the production of large crucible in China. The production and use of raw materials quartz sand by the United States imports and Norway high pure quartz sand two. There are also small factory using quartz crucible domestic materials production of raw materials for the drawing of single crystal silicon and its stability are affected.
The crucible production coating technology has been most manufacturers use is ordinary quartz sand in the dissolution of the crucible surface coated with a layer of barium peroxide solution to form a dense layer and the dense layer can prevent silicon high temperature drawing process of silicon and quartz crucible reaction crystal forming rate is improved.